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Film formation processing

We can handle everything from thin film formation to patterning and plating in a consistent process!

Thin film formation technology can be categorized into physical vapor deposition (PVD), chemical vapor deposition (CVD), and liquid phase methods. The thin film formation technologies available at Hohwa Industries Co., Ltd. include resistance heating, electron beam (EB) evaporation, sputtering, and ion plating for vapor growth methods applied to base materials such as glass, silicon wafers, ceramics, and films. In liquid phase growth methods, we can accommodate processing using electroplating, electroless plating, and sol-gel methods. These technologies are applied in the production of optical and electronic components, and we also provide film selection and design tailored to the intended use and methods. For more details, please contact us or refer to our catalog.

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